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searching for Extreme ultraviolet lithography 10 found (47 total)

alternate case: extreme ultraviolet lithography

Jeffrey Bokor (247 words) [view diff] exact match in snippet view article find links to article

time-resolved, two-photon photoemission, and contributions to extreme ultraviolet lithography and sub-micron MOSFET device development." The IEEE awarded

Advanced Light Source (909 words) [view diff] exact match in snippet view article find links to article

cells Chemical reaction dynamics Atomic and molecular physics Extreme ultraviolet lithography Synchrotron infrared nano-spectroscopy (SINS) Longer-lasting

David Attwood (physicist) (321 words) [view diff] exact match in snippet view article

1038/nature03719. PMID 15988520. S2CID 4314046. Gwyn, C. W. (1998). "Extreme ultraviolet lithography". Journal of Vacuum Science & Technology B: Microelectronics

Keith Jackson (physicist) (627 words) [view diff] exact match in snippet view article

org/publications/apsnews/200205/backpage.cfm K. H. Jackson et al., "Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic

Resolution enhancement technologies (1,197 words) [view diff] case mismatch in snippet view article find links to article

mask data preparation. Inverse lithography technology "EUV: Extreme Ultraviolet Lithography - Semiconductor Engineering". Electronic Design Automation

Yamazaki-Teiichi Prize (1,304 words) [view diff] exact match in snippet view article find links to article

research and longtime contribution for industrial approach on extreme ultraviolet lithography. 2011 - Digh Hisamoto. Invention and development of "fin" structure

Artificial Intelligence Cold War (1,814 words) [view diff] exact match in snippet view article find links to article

equipment to China. ASML manufactures a machine called an extreme ultraviolet lithography system used by semiconductor producers, including TSMC and

Richard R. Freeman (1,648 words) [view diff] no match in snippet view article find links to article

L.; Jewell, Tanya E. (1994). "Development of a laboratory extreme-ultraviolet lithography tool". In Patterson, David O (ed.). Electron-Beam, X-Ray, and

European Inventor Award (5,861 words) [view diff] exact match in snippet view article find links to article

Loopstra and Vadim Banine (The Netherlands/Russia) for inventing extreme ultraviolet lithography The 2019 award ceremony was held in Vienna, Austria, on 20

List of fellows of IEEE Electron Devices Society (69 words) [view diff] no match in snippet view article find links to article

electronic materials and devices 2018 Anthony Yen For leadership in extreme-ultraviolet lithography for high volume manufacture of integrated circuits 2019 Matthias