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digital and analogue processes, e.g. optical microlithography or photography. In the case of optical microlithography this value statistically describes theChris Mack (scientist) (312 words) [view diff] exact match in snippet view article
Chris Mack Roast at the SPIE Microlithography conference. In 2009, Mack was awarded the Frits Zernike Award for Microlithography at the SPIE Advanced LithographyPhotomask (2,195 words) [view diff] exact match in snippet view article find links to article
phase-shifting masks". In Wiley, James N. (ed.). 10th Annual Symp on Microlithography. Vol. 1496. pp. 27–53. doi:10.1117/12.29750. S2CID 109009678. Eom,Resolution enhancement technology (189 words) [view diff] exact match in snippet view article find links to article
extensions for the future". Proc. SPIE 5377, Optical Microlithography XVII. Optical Microlithography XVII. 5377: 1. Bibcode:2004SPIE.5377....1S. doi:10GDSII (770 words) [view diff] exact match in snippet view article find links to article
Calma, February 1987 SPIE Handbook of Microlithography, Micromachining and Microfabrication, Vol. 1: Microlithography // Bellingham, Wash. : SPIE OpticalElectron-beam lithography (4,735 words) [view diff] exact match in snippet view article find links to article
Rooks, M.J. (2000). "2. Electron beam lithography". Microlithography. SPIE Handbook of Microlithography, Micromachining and Microfabrication. Vol. 1. ArchivedCarl Zeiss SMT (606 words) [view diff] exact match in snippet view article find links to article
Prosenjit (Ed.) (1997). Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography. SPIE Press. p. 83. Benschop, Jos;Micralign (3,761 words) [view diff] exact match in snippet view article find links to article
through the second half of the 1970s and early 1980s. Formed into the Microlithography Division, by 1980 its income was the largest of Perkin-Elmer's divisionsPhase-shift mask (805 words) [view diff] exact match in snippet view article find links to article
Rai-Choudhury, P., editor (1997). Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography. Bellingham, Washington: SPIE OpticalStigmator (825 words) [view diff] exact match in snippet view article find links to article
Rai-Choudhury (January 1997). Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography. IET. p. 154. ISBN 978-0-85296-906-9. PeterClifford Paterson Lecture (682 words) [view diff] exact match in snippet view article find links to article
At home with science and technology 1988 Walter Thompson Welford on Microlithography and the ultraviolet: experiments with an excimer laser 1989 Alan WalterMultiple patterning (7,206 words) [view diff] exact match in snippet view article find links to article
self alignment double patterning (SADP)". Optical Microlithography XXI. 6924. Optical Microlithography XXI; 69244E: 69244E. Bibcode:2008SPIE.6924E..4EBRotating ring-disk electrode (1,063 words) [view diff] exact match in snippet view article find links to article
0.1 and 0.5 millimeters, and narrower gaps have been created using microlithography techniques. Another important parameter for an RRDE is the "collectionMEMS (5,625 words) [view diff] exact match in snippet view article find links to article
In Choudhury PR (ed.). Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography. Vol. 1. London: SPIE. doi:10.1117/3Peter Trefonas (1,627 words) [view diff] exact match in snippet view article find links to article
Engineering in 2018 for the "invention of photoresist materials and microlithography methods underpinning multiple generations of microelectronics". DuPontTitanium nitride (1,849 words) [view diff] exact match in snippet view article find links to article
Proceedings of SPIE. Metrology, Inspection, and Process Control for Microlithography XXII. 6922 (2): 69220V. Bibcode:2008SPIE.6922E..0VD. doi:10.1117/12Walter Thompson Welford (1,379 words) [view diff] exact match in snippet view article find links to article
elected to the Royal Society in 1980. He also won awards for his work in Microlithography and the ultraviolet: experiments with an excimer laser. Patents HeKevin Rolland Thompson (506 words) [view diff] exact match in snippet view article find links to article
at Perkin-Elmer Corporation for 10 years as an optical designer in microlithography applications and advanced systems for ground- and space-based remoteSPIE (1,295 words) [view diff] exact match in snippet view article find links to article
Early Career Achievement Awards (since 2008) Frits Zernike Award for Microlithography (since 2004) G.G. Stokes Award in Optical Polarization (since 2004)14 nm process (2,618 words) [view diff] exact match in snippet view article find links to article
to 16-nm product design and patterning flows". Proc. SPIE. Optical Microlithography XXIII. 7640: 76400S. Bibcode:2010SPIE.7640E..0SN. doi:10.1117/12.848194Ultratech (1,087 words) [view diff] exact match in snippet view article find links to article
located in Santa Clara, California. The product line consisted of 1x microlithography steppers, using a unique catadioptric lens design. Until 1992, UltratechCorning Inc. (2,788 words) [view diff] exact match in snippet view article find links to article
Corning Incorporated manufactures a high-purity fused silica employed in microlithography systems, a low expansion glass utilized in the construction of reflective3ω-method (535 words) [view diff] exact match in snippet view article find links to article
steady-state techniques. Although some expertise in thin film patterning and microlithography is required, this technique is considered as the best pseudo-contactContact lithography (1,938 words) [view diff] exact match in snippet view article find links to article
(as the oxide surface is not a metal). Su, Frederic (1997-02-01). "Microlithography: from contact printing to projection systems". SPIE Newsroom. SPIE-IntlAlan David White (717 words) [view diff] exact match in snippet view article find links to article
also made significant contributions to the development of lenses for microlithography, as well as methods for aligning a lithographic mask using specialLow-temperature polycrystalline silicon (1,501 words) [view diff] exact match in snippet view article find links to article
element to control the image resolution. Enhancing the performance and microlithography for TFTs is important for advancing LTPS active-matrix OLEDs. TheseDense plasma focus (4,603 words) [view diff] exact match in snippet view article find links to article
diagnostics (soft x-rays, neutrons, electron and ion beams), applications (microlithography, micromachining, materials modification and fabrication, imaging &Length measurement (3,394 words) [view diff] exact match in snippet view article find links to article
Proceedings of SPIE. Metrology, Inspection, and Process Control for Microlithography XXI. 6518: 651810. Bibcode:2007SPIE.6518E..10O. doi:10.1117/12.713368Anti-reflective coating (4,057 words) [view diff] exact match in snippet view article find links to article
Silver, Richard M (ed.). Metrology, Inspection, and Process Control for Microlithography XVIII. Vol. 5375. SPIE. pp. 940–948. Bibcode:2004SPIE.5375..940Y. doi:10Telecentric lens (1,261 words) [view diff] exact match in snippet view article find links to article
Lithographic Lens: its history and evolution" (PDF). Proc. SPIE. Optical Microlithography XIX. 6154: 615403. Bibcode:2006SPIE.6154...24M. doi:10.1117/12.656163Deoxycholic acid (3,031 words) [view diff] exact match in snippet view article find links to article
incorporation in nanotechnology. They also have found application in microlithography as photoresistant components. In the United States, deoxycholic acidLean manufacturing (7,462 words) [view diff] exact match in snippet view article find links to article
Continuous flow manufacturing. Proc. SPIE1496, 10th Annual Symposium on Microlithography. (March 1, 1991), 239–246. Roebuck, Kevin. 2011. Business Process Modeling:Semiconductor device fabrication (10,972 words) [view diff] exact match in snippet view article find links to article
Visiting GlobalFoundries". PCMag Asia. Retrieved November 23, 2023. Microlithography: Science and Technology, Second Edition. CRC Press. 3 October 2018Two-photon absorption (4,647 words) [view diff] exact match in snippet view article find links to article
"Two-photon lithography for microelectronic application". Optical/Laser Microlithography V. 1674. SPIE: 776–782. Bibcode:1992SPIE.1674..776W. doi:10.1117/12Extreme ultraviolet lithography (15,597 words) [view diff] exact match in snippet view article find links to article
extreme-ultraviolet lithography. 23. SPIE annual international symposium on microlithography conference, Santa Clara, CA (United States), 22-27 Feb 1998. OSTI 310916Thermal conductivity measurement (4,102 words) [view diff] exact match in snippet view article find links to article
steady-state techniques. Although some expertise in thin film patterning and microlithography is required, this technique is considered as the best pseudo-contactSamuel Kounaves (1,954 words) [view diff] exact match in snippet view article find links to article
1021/ac00217a004. "Iridium-Based Ultramicroelectrode Array Fabricated by Microlithography" (PDF). "On-Site Analysis of Arsenic in Groundwater Using a MicrofabricatedDavid A. Hammer (1,826 words) [view diff] exact match in snippet view article find links to article
; Kalantar, Daniel H. & Qi, Nian-Sheng, "Method and apparatus for microlithography using x-pinch x-ray source", issued 1992-04-07 "Exploding wires openProbe tip (8,217 words) [view diff] exact match in snippet view article find links to article
Inspection, and Process Control for Microlithography XIII. Metrology, Inspection, and Process Control for Microlithography XIII. Vol. 3677. p. 20. doi:10.1117/12List of fellows of IEEE Electron Devices Society (69 words) [view diff] exact match in snippet view article find links to article
1994 Martin Peckerar For contributions to and leadership in X-ray and microlithography 1994 James Spratt For contributions to the design and fabrication ofList of fellows of IEEE Solid-State Circuits Society (73 words) [view diff] exact match in snippet view article find links to article
1994 Martin Peckerar for contributions to and leadership in X-ray and microlithography 1994 Tsutomu Sasao for contributions to the design theory and techniques